Patent name: Substrate and process related to the manufacture of the structure Patent application number: O181 1373.7
Open: 1437715
Applicant: The Swedish company Obodukat relates to a substrate for nanolithography, the substrate comprising at least a first coating and a second coating arranged on a surface of the substrate. The first coating consists of a positive resist and the second coating consists of a negative resist. The present invention also relates to a process associated with nanoprinting lithography on a substrate in which a nanoscale pattern is embossed in a second coating through a stencil in a first stage, and then in a second stage A substantially isotropic development process is performed on the surface of the first coating exposed in the first stage, the development method and the materials used for the first and second coatings are selected such that the first coating The development of the layer is faster than the development of the second coating so that an undercut profile is obtained in the coating.
Open: 1437715
Applicant: The Swedish company Obodukat relates to a substrate for nanolithography, the substrate comprising at least a first coating and a second coating arranged on a surface of the substrate. The first coating consists of a positive resist and the second coating consists of a negative resist. The present invention also relates to a process associated with nanoprinting lithography on a substrate in which a nanoscale pattern is embossed in a second coating through a stencil in a first stage, and then in a second stage A substantially isotropic development process is performed on the surface of the first coating exposed in the first stage, the development method and the materials used for the first and second coatings are selected such that the first coating The development of the layer is faster than the development of the second coating so that an undercut profile is obtained in the coating.
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